PECVD

 PECVD

This system was designed and fabricated in the Plasma Physics Research Center. Plasma is produced in low mode direct current discharge and radio frequency.

 the system is utilised in:

1. PECVD for nano structures synthesis;

2. DC/RF Sputtering for thin film growth.

 Specifications:

Reactor: Cylindrical Pyrex

Maximum RF-Power: 1KW

Maximum Direct Voltage: 4KV