Ion Source with regard to their characteristics beam are used in different surface treatments. Such as surface etching or ion implantation. They can also be used for depositing thick or thin layers on different substrates.
This ion source system was designed and built by our staff in 2004.
Gases: Ar, N2,...
Ion Beam Current (For Ar): 50 mA
Maximum Ion Energy: 10 KV
Beam Diameter: 5 cm